
| 1_pdf |
1.
Béché A, Rouvière JL, Barnes JP, Cooper D.
|
| 2_pdf |
2.
Brunetti, D Robert, P Bayle-Guillemaud, JL Rouvière,
EF Rauch, JF Martin, JF Colin, F Bertin and C Cayron |
| 3_pdf |
3. Rouviere JL,
Béché A, Martin Y, Thibaud
Denneulin T, Cooper D
|
| 4_pdf |
4. Wang YY, Bruley J, Meer H van, Li
J, Domenicucci
A, Murray CE, Rouviere JL Strain mapping of Si devices with stress memorization processing. Appl. Phy. Lett. 103 (2013) 052104.
|
| 5_pdf |
5.
Cooper
D, Denneulin T, Barnes J-P, Hartmann J.-M.,
Hutin L., Le Royer C, Béché A., Rouvière J.-L.
|
| 6_pdf |
6. D. Robert, T. Douillard, A. Boulineau, G. Brunetti, P.Nowakowski, D. Venet, P.Bayle-Guillemaud and C.l Cayron |
| 7_pdf |
7. Robach O., Micha, J.S., Ulrich O., Gergaud P. Full local elastic strain tensor from Laue microdiffraction: simultaneous Laue pattern and spot energy measurement J. of Appl. Cryst, 44 688-696 (2011).
|
| 8_pdf |
8. Robach, J.-S. Micha, O. Ulrich, O. Geaymond, O. Sicardy, J. Härtwig and F. Rieutord
|
| 9_pdf |
9.
D. Ferreira Sancheza, D. Laloum, M. Larissa Djomeni Weleguela, O.
Ulrich, G. Audoit, A. Grenier, J.-S. Micha, O. Robach, F. Lorut, P.
Gergaud, P. Bleuet, X-ray µ-Laue diffraction analysis of Cu through-silicon vias: a 2D and 3D study
|
| 10_pdf |
10. Villanova J., Maurice C., Micha J.S., Bleuet P., Sicardy O., Fortunier R. |
| 11_pdf |
11. Maurice C., Driver J.H. and Fortunier R.
|
| 12_pdf |
12. Maurice C., Quey R., Fortunier R., Driver J.H. High Angular Resolution EBSD and Its Material Applications In book: Microstructural Design of Advanced Engineering Materials, Chapter: 14, Publisher: Wiley, Editors: Dmitri A. Molodov, 341-365.
|
| 13_pdf |
13. Zhang, Z Rauch E.F. Véron. M
|
| 14_pdf |
14. |
|
Poster AMOS J3N UltJ3N Strasbourg 7-9 novembre 2011 |
|
|
C. MAURICE, K. DZIECIOL, R. FORTUNIER A method for accurate localisation of EBSD pattern centres Ultramicroscopy 111 (2011) 140-148 |
En cas de souci ou de bug, contactez l'administrateur du site web